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Deposition Kinetics and Thermal Properties of Atmospheric Plasma Deposited Methacrylate-Like Films

Scheltjens G., Da Ponte G., Paulussen S., De Graeve I., Terryn H., Reniers F., Van Assche G. and Van Mele B.Deposition Kinetics and Thermal Properties of Atmospheric Plasma Deposited Methacrylate-Like Films,Plasma Processes and Polymers,13(5): 521-533,2016 (MAY).

doi: 10.1002/ppap.201500137

Allyl methacrylate (AMA), methyl methacrylate (MMA), and propyl isobutyrate (PiB) are plasma deposited at ambient temperature in an atmospheric DBD reactor to assess the effect of precursor carbon double bond unsaturations. The specific plasma deposition rate (k(0)) as a function of the Yasuda factor (Y-f) is quantified empirically by: k(0) = b (1 - exp(-a Y-f/b)). Fourier transform infrared analysis indicates a loss of carbonyl functionalities with increasing plasma power, and Raman microscopy shows C=C double bonds in all plasma films. The methacrylate-like plasma films are found to be heterogeneous with a volatile and a cross-linked fraction observed by thermogravimetric analysis. Differential scanning calorimetry reveals a low glass transition temperature and a characteristic residual reactivity of the coatings.

BibTeX

@article{,
    author  = "Scheltjens, G.; Da Ponte, G.; Paulussen, S.; De Graeve, I.; Terryn, H.; Reniers, F.; Van Assche, G. ; Van Mele, B.",
    title   = "Deposition Kinetics and Thermal Properties of Atmospheric Plasma Deposited Methacrylate-Like Films",
    journal = "Plasma Processes and Polymers",
    year    = "2016",
    volume  = "13",
    number  = "5",
    pages   = "521-533",
    month   = "MAY",
    doi     = "10.1002/ppap.201500137",
    note    = "",
}